China Develops GAA Transistors That Enable 3nm Node-Like Performance On DUV Lithography, But MEOL Constraints Only Provide A Path To 5nm Node-Equivalent Performance

Despite the fact that American export controls continue to restrict China to the older DUV lithography tech, the Asian giant has been using innovative techniques to extract the maximum possible juice from these older machines, and the Chinese Academy of Sciences might just have carved out a viable pathway to 3nm-like performance - albeit constra...

سەرچاوەی فەرمی بە زمانی ئینگلیزی: https://wccftech.com/china-develops-gaa-transistors-that-enable-3nm-node-like-performance-on-duv-lithography-but-meol-constraints-only-provide-a-path-to-5nm-node-equivalent-performance/